On the Origin of Photochemically Generated Protons in Polymethacrylate Films
-A New Structure of PAG
Journal of Photopolymer Science and Technology Volume 12,
Number 4, 1999, p.637-640
The Importance of OH groups Containing Solid Films for High Sensitivity
of Chemically Amprified Resists
Journal of Photopolymer Science and Technology Volume 13,
Number 4, 2000, p.503-506